Recent Developments in Oxide and Metal Epitaxy-Theory and Experiment Symposium Held April 23-26, 2000, San Francisco, California, U.S.A

Thin-film epitaxy is integral to many current and emerging technologies, and continued progress in solving critical issues is essential to the realization of new devices. This volume from MRS focuses on progress in solving fundamental issues in the epitaxial growth of metals and oxides. Presentations cover both fundamental studies and technological applications. Insights from both experiment, and modeling and simulation, are combined to facilitate cross fertilization of ideas and understanding. One highlight is the use of "in situ characterization techniques for enhancing the efficiency of materials development. Thin-film research is often unavoidably empirical in nature. Techniques for minimizing the time spent exploring the complex parameter space in order to optimize growth and processing conditions are of particular value to the materials scientist. Among the techniques discussed are spectroscopic ellipsometry and ion scattering and recoil spectrometry, LEEM (low-energy electron microscopy), STM (scanning tunneling microscopy), TEM (transmission electron microscopy) and RHEED (reflection high-energy electron diffraction).Yeadon, M. is the author of 'Recent Developments in Oxide and Metal Epitaxy-Theory and Experiment Symposium Held April 23-26, 2000, San Francisco, California, U.S.A' with ISBN 9781558995277 and ISBN 1558995277.