Nontraditional Approaches to Patterning

More and more researchers are recognizing the importance of patterning materials into well-defined structures, and their immediate impacts to many areas that include physics, chemistry, biology, and engineering. Compared to traditional lithographic techniques, nontraditional approaches (e.g., self assembly, soft lithography, embossing, dip-pen lithography, scanning probe lithography, and laser-induced patterning) provide avenues to explore new scientific phenomena, as well as to realize new devices in microelectronics, photonics, sensors, MEMS, and lab-on-chip systems with lower cost, higher throughput, and larger quantities. The ability to directly pattern materials in three dimensions (e.g., self assembly, two-photon absorption and interference lithography) with tailored shape, size, and chemistry provides unparalleled control over material structures and properties. In this volume, a wide range of researchers from academia, industry and government laboratories come together to exchange views, to learn about the latest advancement in materials science and engineering, and to develop new concepts and research directions in material patterning. Topics include: synthesis and assembly of nanostructures; soft lithography; SPM-based nanolithography; self assembly; 3D patterning; and other methods.Xia, Younan is the author of 'Nontraditional Approaches to Patterning', published 2004 under ISBN 9781558997462 and ISBN 1558997466.