486986
9780123496706
Out of Stock
The item you're looking for is currently unavailable.
This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.Hitchman, M. L. is the author of 'Chemical Vapor Deposition Principles and Applications' with ISBN 9780123496706 and ISBN 0123496705.
[read more]